Sfoglia per Autore
Dissolution kinetics of boron-interstitial clusters in silicon
2003-01-01 Mirabella, Salvatore; Bruno, Elena; Priolo, Francesco; De Salvador, D; Napolitani, E; Drigo, Av; Carnera, A.
Lattice strain and composition of Boron-Interstitial Clusters in Crystalline Silicon
2004-01-01 DE SALVADOR, D; Bisognin, G; Napolitani, E; Aldegheri, L; Drigo, A. V.; Carnera, A; Mirabella, S; Bruno, Elena; Impellizzeri, G; Priolo, Francesco
Boron-interstitial clusters in cristalline silicon: stoichiometry and strain
2004-01-01 Bisognin, G; DE SALVADOR, D; Napolitani, E; Aldegheri, L; Berti, M; Carnera, A; Drigo, A. V.; Mirabella, Salvatore; Bruno, Elena; Impellizzeri, G; Priolo, Francesco
Dissolution kinetics of B clusters in crystalline Si
2005-01-01 DE SALVADOR, D; Napolitani, E; Bisognin, G; Carnera, A; Bruno, Elena; Mirabella, Salvatore; Impellizzeri, G; Priolo, Francesco
Fluorine segregation and incorporation during solid phase epitaxy of Si
2005-01-01 Mirabella, Salvatore; G., Impellizzeri; Bruno, Elena; Romano, Lucia; Grimaldi, Maria Grazia; Priolo, Francesco; E., Napolitani; A., Carnera
Effect of self-interstitials – nanovoids interaction on two-dimensional diffusion and activation of limplanted B in Si
2005-01-01 Giannazzo, F; Bruno, Elena; Mirabella, Salvatore; Impellizzeri, G; Napolitani, E; Raineri, V; Priolo, Francesco; Alquier, D.
Experimental evidences for two paths in the dissolution process of B clusters in crystalline Si
2005-01-01 De Salvador, D; Napolitani, E; Bisognin, G; Carnera, A; Bruno, Elena; Mirabella, Salvatore; Impellizzeri, G; Priolo, Francesco
B Activation Enhancement in Submicron Confined Implants in Si
2005-01-01 Bruno, Elena; Mirabella, Salvatore; G., Impellizzeri; Priolo, Francesco; F., Giannazzo; V., Raineri; E., Napolitani
Submicron confinement effect on electrical activation of B implanted in Si
2005-01-01 Bruno, Elena; Mirabella, Salvatore; Impellizzeri, G; Priolo, Francesco; Giannazzo, F; Raineri, V; Napolitani, E.
Scanning capacitance microscopy two-dimensional carrier profiling for ultra-shallow junction characterization in deep submicron technology
2005-01-01 Giannazzo, F; Raineri, V; Mirabella, Salvatore; Bruno, Elena; Impellizzeri, G; Priolo, Francesco
Lattice strain induced by boron clusters in crystalline silicon
2006-01-01 Bisognin, G; De Salvador, D; Napolitani, E; Carnera, A; Bruno, Elena; Mirabella, Salvatore; Priolo, Francesco; Mattoni, A.
Role of surface nanovoids on interstitial trapping in He implanted crystalline Si
2006-01-01 Mirabella, Salvatore; Bruno, Elena; Priolo, Francesco; Giannazzo, F; Bongiorno, C; Raineri, V; Napolitani, E; Carnera, A.
Fluorine incorporation in preamorphized silicon
2006-01-01 Impellizzeri, G; Mirabella, Salvatore; Bruno, Elena; Priolo, Francesco; Napolitani, E; Carnera, A.
Size effects on the electrical activation of low-energy implanted B in Si
2006-01-01 Giannazzo, F; Raineri, V; Bruno, Elena; Mirabella, Salvatore; Impellizzeri, G; Priolo, Francesco; Napolitani, E.
He induced nanovoids for point-defect engineering in B-implanted crystalline Si
2007-01-01 Bruno, Elena; Mirabella, Salvatore; Priolo, Francesco; Napolitani, E; Bongiorno, C; Raineri, V.
Effect of He induced nanovoids on B implanted in Si: the microscopic mechanism
2007-01-01 Bruno, Elena; Mirabella, Salvatore; Priolo, Francesco; F., Giannazzo; V., Raineri; E., Napolitani
Evolution of boron-interstitial clusters in crystalline Si studied by transmission electron microscopy
2007-01-01 Boninelli, S; Mirabella, Salvatore; Bruno, Elena; Priolo, Francesco; Cristiano, F; Claverie, A; DE SALVADOR, D; Bisognin, G; Napolitani, E.
He implantation in Si for B diffusion control
2007-01-01 Bruno, Elena; Mirabella, Salvatore; E., Napolitani; F., Giannazzo; V., Raineri; Priolo, Francesco
Indirect Diffusion Mechanism of Boron Atoms in Crystalline and Amorphous Silicon
2008-01-01 Mirabella, Salvatore; De Salvador, D; Napolitani, E; Bruno, Elena; Impellizzeri, G; Bisognin, G; Pecora, Ef; Carnera, A; Priolo, Francesco
He implantation to control B diffusion in crystalline and preamorphized Si
2008-01-01 Bruno, Elena; Mirabella, Salvatore; Priolo, Francesco; Kuitunen, K; Tuomisto, F; Slotte, J; Giannazzo, F; Bongiorno, C; Raineri, V; Napolitani, E.
Titolo | Data di pubblicazione | Autore(i) | File |
---|---|---|---|
Dissolution kinetics of boron-interstitial clusters in silicon | 1-gen-2003 | Mirabella, Salvatore; Bruno, Elena; Priolo, Francesco; De Salvador, D; Napolitani, E; Drigo, Av; Carnera, A. | |
Lattice strain and composition of Boron-Interstitial Clusters in Crystalline Silicon | 1-gen-2004 | DE SALVADOR, D; Bisognin, G; Napolitani, E; Aldegheri, L; Drigo, A. V.; Carnera, A; Mirabella, S; Bruno, Elena; Impellizzeri, G; Priolo, Francesco | |
Boron-interstitial clusters in cristalline silicon: stoichiometry and strain | 1-gen-2004 | Bisognin, G; DE SALVADOR, D; Napolitani, E; Aldegheri, L; Berti, M; Carnera, A; Drigo, A. V.; Mirabella, Salvatore; Bruno, Elena; Impellizzeri, G; Priolo, Francesco | |
Dissolution kinetics of B clusters in crystalline Si | 1-gen-2005 | DE SALVADOR, D; Napolitani, E; Bisognin, G; Carnera, A; Bruno, Elena; Mirabella, Salvatore; Impellizzeri, G; Priolo, Francesco | |
Fluorine segregation and incorporation during solid phase epitaxy of Si | 1-gen-2005 | Mirabella, Salvatore; G., Impellizzeri; Bruno, Elena; Romano, Lucia; Grimaldi, Maria Grazia; Priolo, Francesco; E., Napolitani; A., Carnera | |
Effect of self-interstitials – nanovoids interaction on two-dimensional diffusion and activation of limplanted B in Si | 1-gen-2005 | Giannazzo, F; Bruno, Elena; Mirabella, Salvatore; Impellizzeri, G; Napolitani, E; Raineri, V; Priolo, Francesco; Alquier, D. | |
Experimental evidences for two paths in the dissolution process of B clusters in crystalline Si | 1-gen-2005 | De Salvador, D; Napolitani, E; Bisognin, G; Carnera, A; Bruno, Elena; Mirabella, Salvatore; Impellizzeri, G; Priolo, Francesco | |
B Activation Enhancement in Submicron Confined Implants in Si | 1-gen-2005 | Bruno, Elena; Mirabella, Salvatore; G., Impellizzeri; Priolo, Francesco; F., Giannazzo; V., Raineri; E., Napolitani | |
Submicron confinement effect on electrical activation of B implanted in Si | 1-gen-2005 | Bruno, Elena; Mirabella, Salvatore; Impellizzeri, G; Priolo, Francesco; Giannazzo, F; Raineri, V; Napolitani, E. | |
Scanning capacitance microscopy two-dimensional carrier profiling for ultra-shallow junction characterization in deep submicron technology | 1-gen-2005 | Giannazzo, F; Raineri, V; Mirabella, Salvatore; Bruno, Elena; Impellizzeri, G; Priolo, Francesco | |
Lattice strain induced by boron clusters in crystalline silicon | 1-gen-2006 | Bisognin, G; De Salvador, D; Napolitani, E; Carnera, A; Bruno, Elena; Mirabella, Salvatore; Priolo, Francesco; Mattoni, A. | |
Role of surface nanovoids on interstitial trapping in He implanted crystalline Si | 1-gen-2006 | Mirabella, Salvatore; Bruno, Elena; Priolo, Francesco; Giannazzo, F; Bongiorno, C; Raineri, V; Napolitani, E; Carnera, A. | |
Fluorine incorporation in preamorphized silicon | 1-gen-2006 | Impellizzeri, G; Mirabella, Salvatore; Bruno, Elena; Priolo, Francesco; Napolitani, E; Carnera, A. | |
Size effects on the electrical activation of low-energy implanted B in Si | 1-gen-2006 | Giannazzo, F; Raineri, V; Bruno, Elena; Mirabella, Salvatore; Impellizzeri, G; Priolo, Francesco; Napolitani, E. | |
He induced nanovoids for point-defect engineering in B-implanted crystalline Si | 1-gen-2007 | Bruno, Elena; Mirabella, Salvatore; Priolo, Francesco; Napolitani, E; Bongiorno, C; Raineri, V. | |
Effect of He induced nanovoids on B implanted in Si: the microscopic mechanism | 1-gen-2007 | Bruno, Elena; Mirabella, Salvatore; Priolo, Francesco; F., Giannazzo; V., Raineri; E., Napolitani | |
Evolution of boron-interstitial clusters in crystalline Si studied by transmission electron microscopy | 1-gen-2007 | Boninelli, S; Mirabella, Salvatore; Bruno, Elena; Priolo, Francesco; Cristiano, F; Claverie, A; DE SALVADOR, D; Bisognin, G; Napolitani, E. | |
He implantation in Si for B diffusion control | 1-gen-2007 | Bruno, Elena; Mirabella, Salvatore; E., Napolitani; F., Giannazzo; V., Raineri; Priolo, Francesco | |
Indirect Diffusion Mechanism of Boron Atoms in Crystalline and Amorphous Silicon | 1-gen-2008 | Mirabella, Salvatore; De Salvador, D; Napolitani, E; Bruno, Elena; Impellizzeri, G; Bisognin, G; Pecora, Ef; Carnera, A; Priolo, Francesco | |
He implantation to control B diffusion in crystalline and preamorphized Si | 1-gen-2008 | Bruno, Elena; Mirabella, Salvatore; Priolo, Francesco; Kuitunen, K; Tuomisto, F; Slotte, J; Giannazzo, F; Bongiorno, C; Raineri, V; Napolitani, E. |
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