Si(111) substrates were functionalized with a covalent 4-ClCH(2)C(6)H(4)SiCl(3) monolayer that binds to the surface using the -SiCl(3) group and leaves an unreacted -CH(2)Cl group. The remaining benzyl chloride functionality at the top of the Si(111) substrate allowed additional functionalization by an atom transfer radical polymerization process, mediated by copper complexes. Ordered, surface-confined polystyrene assemblies, covalently bound to the silicon, have been obtained. Atomic force microscopy measurements show a long-range order of these nanostructures. X-ray photoelectron spectroscopy provided quantitative results on the surface atomic composition as well as on the nanostructure thickness. The polystyrene structures on the silicon surface were also investigated by attenuated total reflectance infrared spectroscopy.
Si(111) Surface Engineered with Ordered Nanostructures by an Atom Transfer Radical Polymerization
MINEO, PLACIDO;GULINO, Antonino
2011-01-01
Abstract
Si(111) substrates were functionalized with a covalent 4-ClCH(2)C(6)H(4)SiCl(3) monolayer that binds to the surface using the -SiCl(3) group and leaves an unreacted -CH(2)Cl group. The remaining benzyl chloride functionality at the top of the Si(111) substrate allowed additional functionalization by an atom transfer radical polymerization process, mediated by copper complexes. Ordered, surface-confined polystyrene assemblies, covalently bound to the silicon, have been obtained. Atomic force microscopy measurements show a long-range order of these nanostructures. X-ray photoelectron spectroscopy provided quantitative results on the surface atomic composition as well as on the nanostructure thickness. The polystyrene structures on the silicon surface were also investigated by attenuated total reflectance infrared spectroscopy.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
