Carbon aligned nanocolumns are grown on Si substrates by means of the radiofrequency (RF)-magnetron sputtering technique. The structural and chemical characterization is reported, showing that a considerable arnount of nitrogen, introduced during the deposition process, is contained in the C nanostructures determining the columnar shape. In particular, it is shown that some deposition parameters, such as the gas used for sputtering, the temperature and the RF power, influence the shape and the nitrogen-to-carbon [N]/[C] concentration ratio in the C nanostructures. (C) 2006 Elsevier B.V. All rights reserved.
Carbon aligned nanocolumns by RF-Magnetron sputtering: The influence of the growth parameters
COMPAGNINI, Giuseppe Romano;
2007-01-01
Abstract
Carbon aligned nanocolumns are grown on Si substrates by means of the radiofrequency (RF)-magnetron sputtering technique. The structural and chemical characterization is reported, showing that a considerable arnount of nitrogen, introduced during the deposition process, is contained in the C nanostructures determining the columnar shape. In particular, it is shown that some deposition parameters, such as the gas used for sputtering, the temperature and the RF power, influence the shape and the nitrogen-to-carbon [N]/[C] concentration ratio in the C nanostructures. (C) 2006 Elsevier B.V. All rights reserved.File in questo prodotto:
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