TOMASELLA, PASCAL
TOMASELLA, PASCAL
SCIENZE CHIMICHE
CTAB removal and graphene oxide functionalization of metallic nanorods for theranostic applications
file da validare2022-01-01 Foti, A.; Sanfilippo, V.; Tomasella, P.; Le Meur, L.; Bretot, T.; Petralia, S.; Satriano, C.
Plasmonic tuning of GO-based nanosheets by Ag nanorods for self-cleaning photothermal surfaces to fight surface contamination
file da validare2022-01-01 Tomasella, P.; Sanfilippo, V.; Foti, A.; Fraix, A.; Petralia, S.; Forte, G.; Fortuna, C.; Giuffrida, A.; Subbiahdioss, G.; Reimhult, E.; Satriano, C.
Plasmonic tuning of GO-based nanosheets by plasmonic noble metal nanorods for self-cleaning photothermal surfaces to fight surface contamination
file da validare2022-01-01 Sanfilippo, V.; Tomasella, P.; Foti, A.; Fraix, A.; Petralia, S.; Forte, G.; Fortuna, C.; Giuffrida, A.; Satriano, C.
Role of Density and Conformational Composition in the Surface-to-Bulk Molecular Dosing of Photosensitive Surfactant Monolayers
2024-01-01 Tomasella, Pascal; Lucifora, Giovanni; Ruffino, Roberta; Pandino, Irene; TRUSSO SFRAZZETTO, Giuseppe; Tuccitto, Nunzio; Li-Destri, Giovanni
| Titolo | Data di pubblicazione | Autore(i) | File |
|---|---|---|---|
| CTAB removal and graphene oxide functionalization of metallic nanorods for theranostic applications | 1-gen-2022 | Foti, A.; Sanfilippo, V.; Tomasella, P.; Le Meur, L.; Bretot, T.; Petralia, S.; Satriano, C. | file da validare |
| Plasmonic tuning of GO-based nanosheets by Ag nanorods for self-cleaning photothermal surfaces to fight surface contamination | 1-gen-2022 | Tomasella, P.; Sanfilippo, V.; Foti, A.; Fraix, A.; Petralia, S.; Forte, G.; Fortuna, C.; Giuffrida, A.; Subbiahdioss, G.; Reimhult, E.; Satriano, C. | file da validare |
| Plasmonic tuning of GO-based nanosheets by plasmonic noble metal nanorods for self-cleaning photothermal surfaces to fight surface contamination | 1-gen-2022 | Sanfilippo, V.; Tomasella, P.; Foti, A.; Fraix, A.; Petralia, S.; Forte, G.; Fortuna, C.; Giuffrida, A.; Satriano, C. | file da validare |
| Role of Density and Conformational Composition in the Surface-to-Bulk Molecular Dosing of Photosensitive Surfactant Monolayers | 1-gen-2024 | Tomasella, Pascal; Lucifora, Giovanni; Ruffino, Roberta; Pandino, Irene; TRUSSO SFRAZZETTO, Giuseppe; Tuccitto, Nunzio; Li-Destri, Giovanni |