The doping profile optimization in semiconductor has been tackled as a constrained optimization problem coupled with a drift-diffusion model to simulat. The physical phenomenon. A new population-based algorithm. The Constrained Immunological Algorithm, has been introduced an. The experimental results confirm that clearly outperforms previous state-of-theart algorithms in doping profile optimization. Supplementary Materials: more numerical results are available at http://www.dmi.unict.it/~stracquadanio/semiconductors.html.
Titolo: | Doping profile optimization in semiconductor design |
Autori interni: | |
Data di pubblicazione: | 2009 |
Handle: | http://hdl.handle.net/20.500.11769/84015 |
ISBN: | 978-142445091-6 |
Appare nelle tipologie: | 4.1 Contributo in Atti di convegno |
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