The doping profile optimization in semiconductor has been tackled as a constrained optimization problem coupled with a drift-diffusion model to simulat. The physical phenomenon. A new population-based algorithm. The Constrained Immunological Algorithm, has been introduced an. The experimental results confirm that clearly outperforms previous state-of-theart algorithms in doping profile optimization. Supplementary Materials: more numerical results are available at http://www.dmi.unict.it/~stracquadanio/semiconductors.html.
|Titolo:||Doping profile optimization in semiconductor design|
|Data di pubblicazione:||2009|
|Appare nelle tipologie:||4.1 Contributo in Atti di convegno|