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Transient behavior of the strong violet electroluminescence of Ge-implanted SiO2 layers
file da validare2002-01-01 L., Rebohle; T., Gebel; J., VON BORANY; W., Skorupa; M., Helm; D., Pacifici; G., Franzo'; Priolo, Francesco
Transient enhanced diffusion of B mediated by self-interstitials in preamorphized Ge
2010-01-01 Napolitani, E; Bisognin, G; Bruno, Elena; Mastromatteo, M; Scapellato, G; Boninelli, S; DE SALVADOR, D; Mirabella, Salvatore; Spinella, C; Carnera, A; Priolo, Francesco
Transient Enhanced Diffusion of Ultra-Low-Energy Implanted Boron in Silicon: The Localization of the Source
file da validare2000-01-01 E., Schroer; V., Privitera; Priolo, Francesco; E., Napolitani; A., Carnera; S., Moffatt
Trap-limited migration of Si self-interstitials at room temperature
file da validare1996-01-01 Larsen, Kk; Privitera, V; Coffa, S; Priolo, Francesco; Campisano, Su; Carnera, A.
TRAPPING OF AU IN SI DURING PULSED LASER IRRADIATION - A COMPARISON WITH ION-BEAM INDUCED SEGREGATION
file da validare1988-01-01 Priolo, Francesco; Poate, Jm; Jacobson, Dc; Batstone, Jl; Custer, Js; Thompson, Mo
TWIN FORMATION AND AU SEGREGATION DURING ION-BEAM-INDUCED EPITAXY OF AMORPHOUS SI
file da validare1988-01-01 Priolo, Francesco; Batstone, Jl; Poate, Jm; Linnros, J; Jacobson, Dc; Thompson, Mo
Two Dimensional Boron Diffusion by Scanning Capacitance Microscopy
file da validare2002-01-01 F., Giannazzo; V., Raineri; Priolo, Francesco
Two Dimensional Effects on Low Energy B Implants in Si
file da validare2002-01-01 F., Giannazzo; Priolo, Francesco; V., Raineri; V., Privitera; A., Picariello; A., Battaglia; S., Moffatt
Two dimensional interstitial diffusion in mesoscopic structures
file da validare2004-01-01 Giannazzo, F; Raineri, V; Mirabella, Salvatore; De Salvador, D; Napolitani, E; Priolo, Francesco
Two-dimensional interstitial diffusion in silicon monitored by scanning capacitance microscopy
file da validare2003-01-01 Giannazzo, F; Mirabella, Salvatore; Raineri, V; De Salvador, D; Napolitani, E; Terrasi, Antonio; Carnera, A; Drigo, Av; Priolo, Francesco
| Titolo | Data di pubblicazione | Autore(i) | File |
|---|---|---|---|
| Transient behavior of the strong violet electroluminescence of Ge-implanted SiO2 layers | 1-gen-2002 | L., Rebohle; T., Gebel; J., VON BORANY; W., Skorupa; M., Helm; D., Pacifici; G., Franzo'; Priolo, Francesco | file da validare |
| Transient enhanced diffusion of B mediated by self-interstitials in preamorphized Ge | 1-gen-2010 | Napolitani, E; Bisognin, G; Bruno, Elena; Mastromatteo, M; Scapellato, G; Boninelli, S; DE SALVADOR, D; Mirabella, Salvatore; Spinella, C; Carnera, A; Priolo, Francesco | |
| Transient Enhanced Diffusion of Ultra-Low-Energy Implanted Boron in Silicon: The Localization of the Source | 1-gen-2000 | E., Schroer; V., Privitera; Priolo, Francesco; E., Napolitani; A., Carnera; S., Moffatt | file da validare |
| Trap-limited migration of Si self-interstitials at room temperature | 1-gen-1996 | Larsen, Kk; Privitera, V; Coffa, S; Priolo, Francesco; Campisano, Su; Carnera, A. | file da validare |
| TRAPPING OF AU IN SI DURING PULSED LASER IRRADIATION - A COMPARISON WITH ION-BEAM INDUCED SEGREGATION | 1-gen-1988 | Priolo, Francesco; Poate, Jm; Jacobson, Dc; Batstone, Jl; Custer, Js; Thompson, Mo | file da validare |
| TWIN FORMATION AND AU SEGREGATION DURING ION-BEAM-INDUCED EPITAXY OF AMORPHOUS SI | 1-gen-1988 | Priolo, Francesco; Batstone, Jl; Poate, Jm; Linnros, J; Jacobson, Dc; Thompson, Mo | file da validare |
| Two Dimensional Boron Diffusion by Scanning Capacitance Microscopy | 1-gen-2002 | F., Giannazzo; V., Raineri; Priolo, Francesco | file da validare |
| Two Dimensional Effects on Low Energy B Implants in Si | 1-gen-2002 | F., Giannazzo; Priolo, Francesco; V., Raineri; V., Privitera; A., Picariello; A., Battaglia; S., Moffatt | file da validare |
| Two dimensional interstitial diffusion in mesoscopic structures | 1-gen-2004 | Giannazzo, F; Raineri, V; Mirabella, Salvatore; De Salvador, D; Napolitani, E; Priolo, Francesco | file da validare |
| Two-dimensional interstitial diffusion in silicon monitored by scanning capacitance microscopy | 1-gen-2003 | Giannazzo, F; Mirabella, Salvatore; Raineri, V; De Salvador, D; Napolitani, E; Terrasi, Antonio; Carnera, A; Drigo, Av; Priolo, Francesco | file da validare |
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- 1 Contributo su Rivista 402
- 1 Contributo su Rivista::1.1 Arti... 402
Data di pubblicazione
- 2020 - 2023 17
- 2010 - 2019 89
- 2000 - 2009 178
- 1990 - 1999 100
- 1987 - 1989 18
Rivista
- APPLIED PHYSICS LETTERS 68
- NUCLEAR INSTRUMENTS & METHODS IN ... 52
- JOURNAL OF APPLIED PHYSICS 39
- MATERIALS SCIENCE AND ENGINEERING... 20
- PHYSICAL REVIEW. B, CONDENSED MAT... 18
- JOURNAL OF VACUUM SCIENCE & TECHN... 10
- MATERIALS SCIENCE IN SEMICONDUCTO... 10
- JOURNAL OF LUMINESCENCE 9
- OPTICAL MATERIALS 9
- DIFFUSION AND DEFECT DATA, SOLID ... 8
Keyword
- Electrical and Electronic Enginee... 4
- Electronic 4
- luminescence 4
- Optical and Magnetic Materials 4
- Silicon 4
- silicon 4
- silicon nanowires 4
- biosensor 3
- Condensed Matter Physics 3
- Erbium 3
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- eng 287
- lat 1
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- reserved 72
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