A review. Control over structural organization at the mol. level is an essential requirement for assembling new materials. The strategy of superstructures construction by combination of highly spatial-resolved surface patterning and self-assembly-mediated surface reconstruction is a very attractive approach. Chem. pattern preformed on a surface can be "recognized" by mols. This implies that one of the crit. steps to implementing nanotechnol. involves the capability of fabricating the desired structures at the mol. level. However, to do this, the mechanisms of self-organization of mols. on the solid surface and within patterned regions must be fully understood. The authors discussed bottom-up methods, dealing with the properties and behavior of self-assembled uniform monolayers, and then on several methods to obtain patterned structures involved in the self-organization processes.
|Titolo:||Self-organization at the molecular level and surface patterning|
|Data di pubblicazione:||2012|
|Appare nelle tipologie:||2.1 Contributo in volume (Capitolo o Saggio)|