The thermal degradation of various Polyhedral Oligomeric Silsesquioxane/Polystyrene (POSS/PS) nanocomposites of formula R7 R’1 (SiO1.5)8/PS (where R- and R’- were a cyclopentyl and a substituted phenyl group), at various (3%, 5% and 10%) POSS concentration, was studied in both inert (flowing nitrogen) and oxidative (static air) atmospheres. Nanocomposites were prepared by the polymerization of styrene in the presence of POSS. Degradations were carried out into a thermobalance at various heating rates, and the obtained thermogravimetric (TG) and differential thermogravimetric (DTG) curves were discussed and interpreted.
|Titolo:||Effect of the substituents on the thermal stability of hepta cyclopentyl, phenyl substitued - Polyhedral oligomeric silsesquioxane (hcp-POSS)/polystyrene (PS) nanocomposites|
|Data di pubblicazione:||2012|
|Appare nelle tipologie:||2.1 Contributo in volume (Capitolo o Saggio)|