Ion beam enhanced thermal depolymerization of poly(methyl methacrylate) thin films, 1-2 mu m thick, has been studied in the temperature range 100-400 degrees C using a 300 keV He+ beam at very low fluence (5 x 10(10)-5 x 10(11) ions cm(-2)). A relevant monomer evolution (mass signal m/z = 100) at temperature (150 degrees C) well below the conventional degradation temperature (360 degrees C) has been detected during irradiation. The observed phenomenon is discussed in terms of activation energies and diffusion processes within the investigated films. The possibility offered by this phenomenon of performing a microlithography process in only one step is discussed.
Ion beam enhanced thermal depolymerization of poly(methyl methacrylate)
FRAGALA', Maria Elena;COMPAGNINI, Giuseppe Romano;
1999-01-01
Abstract
Ion beam enhanced thermal depolymerization of poly(methyl methacrylate) thin films, 1-2 mu m thick, has been studied in the temperature range 100-400 degrees C using a 300 keV He+ beam at very low fluence (5 x 10(10)-5 x 10(11) ions cm(-2)). A relevant monomer evolution (mass signal m/z = 100) at temperature (150 degrees C) well below the conventional degradation temperature (360 degrees C) has been detected during irradiation. The observed phenomenon is discussed in terms of activation energies and diffusion processes within the investigated films. The possibility offered by this phenomenon of performing a microlithography process in only one step is discussed.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
