A simple and low-cost approach for the large-scale production of Au nanodendritic structures on Si is presented. Starting from the methodology involving deposition of a Au film on Si and heating the system to high temperatures in an inert ambient containing trace amounts of oxygen for the growth of SiO2 nanowires (NWs), we show that a suppression of the NWs growth and a promotion of the growth of Au nanodendrites occurs when fast heating and cooling rates are used. We analyze the nanodendrites formation process considering the kinetics processes at the Au/Si interface in far from thermodynamic equilibrium situation.

High-temperature annealing of thin Au films on Si: Growth of SiO2 nanowires or Au dendritic nanostructures?

RUFFINO, FRANCESCO;ROMANO, LUCIA;GRIMALDI, Maria Grazia
2012

Abstract

A simple and low-cost approach for the large-scale production of Au nanodendritic structures on Si is presented. Starting from the methodology involving deposition of a Au film on Si and heating the system to high temperatures in an inert ambient containing trace amounts of oxygen for the growth of SiO2 nanowires (NWs), we show that a suppression of the NWs growth and a promotion of the growth of Au nanodendrites occurs when fast heating and cooling rates are used. We analyze the nanodendrites formation process considering the kinetics processes at the Au/Si interface in far from thermodynamic equilibrium situation.
Au nanodendrites; silica nanowires; annealing
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.11769/11698
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