A simple and low-cost approach for the large-scale production of Au nanodendritic structures on Si is presented. Starting from the methodology involving deposition of a Au film on Si and heating the system to high temperatures in an inert ambient containing trace amounts of oxygen for the growth of SiO2 nanowires (NWs), we show that a suppression of the NWs growth and a promotion of the growth of Au nanodendrites occurs when fast heating and cooling rates are used. We analyze the nanodendrites formation process considering the kinetics processes at the Au/Si interface in far from thermodynamic equilibrium situation.
High-temperature annealing of thin Au films on Si: Growth of SiO2 nanowires or Au dendritic nanostructures?
RUFFINO, FRANCESCO;ROMANO, LUCIA;GRIMALDI, Maria Grazia
2012-01-01
Abstract
A simple and low-cost approach for the large-scale production of Au nanodendritic structures on Si is presented. Starting from the methodology involving deposition of a Au film on Si and heating the system to high temperatures in an inert ambient containing trace amounts of oxygen for the growth of SiO2 nanowires (NWs), we show that a suppression of the NWs growth and a promotion of the growth of Au nanodendrites occurs when fast heating and cooling rates are used. We analyze the nanodendrites formation process considering the kinetics processes at the Au/Si interface in far from thermodynamic equilibrium situation.File | Dimensione | Formato | |
---|---|---|---|
Ruffino APL2012.pdf
solo gestori archivio
Tipologia:
Versione Editoriale (PDF)
Licenza:
NON PUBBLICO - Accesso privato/ristretto
Dimensione
3.8 MB
Formato
Adobe PDF
|
3.8 MB | Adobe PDF | Visualizza/Apri |
I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.