Metal-organic (MO)CVD processes using two different precursors, (La(tmhd)(3) and La(tmod)(3)), have been investigated. Insitu Fourier transform infrared (FTIR) spectroscopy investigations and thermal analysis have provided information on their thermal robustness during the sublimation processes and mass-transport properties during MOCVD experiments. Both precursors can be efficiently vaporized in the temperature range 160-230 degrees C even though La(tmod)3 exhibits higher volatility. Lanthanum oxides have been efficiently deposited using a direct liquid injection (DLI) equipped MOCVD reactor in the temperature range 350-500 degrees C for both precursors. The effect of the addition of tetraglyme to the precursor solution has been evaluated. Films mainly consist of different phases of La2O3 and LaO(OH), while the carbon-containing La2O2CO3 phase was observed only on the surface, with no relevant carbon contamination being present in the bulk of the film.
|Titolo:||MOCVD of lanthanum oxides from La(tmhd)(3) and La(tmod)(3) precursors: A thermal and kinetic investigation|
|Data di pubblicazione:||2006|
|Citazione:||MOCVD of lanthanum oxides from La(tmhd)(3) and La(tmod)(3) precursors: A thermal and kinetic investigation / Bedoya C; Condorelli G; Finocchiaro ST; Di Mauro A; Atanasio D; Fragala EL; Cattaneo L; Carella S. - In: CHEMICAL VAPOR DEPOSITION. - ISSN 0948-1907. - 12:1(2006), pp. 46-53.|
|Appare nelle tipologie:||1.1 Articolo in rivista|