ZnO thin films have been grown by metalorganic chemical vapor deposition (MOCVD) and plasma-assisted (PA) MOCVD on c-axis-oriented sapphire (0001) and Si (001) substrates using the novel Zn(2-thenoyltrifluoroacetonate)(2) (.) N,N,N ',N ' tetramethylethylendiamine precursor. The structural, morphological, and optical properties of ZnO films have been investigated. The results show that the 0, PA growth results in highly c-axis-oriented hexagonal ZnO thin films also on cubic substrates. PA-MOCVD ZnO films have good optical properties, as inferred by the presence of a sharp and intense exciton in the dielectric function.
|Titolo:||Plasma-assisted metalorganic chemical vapor deposition growth of ZnO thin films|
|Data di pubblicazione:||2006|
|Appare nelle tipologie:||1.1 Articolo in rivista|