MoO2(acac)(2) has been used as a precursor for the one-step MOCVD of silica- and zirconia-supported MoO3. Pure films were obtained by suitable control of the deposition parameters. The films were characterised by W-VIS spectroscopy, XRD, SEM, wavelength-dispersive X-ray fluorescence analysis and XPS. Silica-supported MoO3 consists of a layered structure packed in the direction of the b axis whilst no preferential orientation was observed for the zirconia-supported films. Films deposited using higher O-2/MoO2(acac)(2) molar ratios consist of pure MoO3, whilst lower O-2/MoO2(acac)(2) values result in the copresence of some Mo suboxides. Deposition rates appear to be largely governed by the O-2/MoO2(acac)(2) molar ratio and they always increase upon decreasing this parameter. Larger crystallite sizes were found to be associated with slower rate regimes.
|Titolo:||Synthesis and spectroscopic characterisation of MoO3 thin films|
|Data di pubblicazione:||1996|
|Citazione:||Synthesis and spectroscopic characterisation of MoO3 thin films / Gulino A; Condorelli GG; Fragala I. - In: JOURNAL OF MATERIALS CHEMISTRY. - ISSN 0959-9428. - 6:8(1996), pp. 1335-1338.|
|Appare nelle tipologie:||1.1 Articolo in rivista|