Proton beam writing technique was recently introduced at 3MV Tandetron accelerator at Nuclear Physics Institute in Rez (Czech Republic). It has been used, to produce three-dimensional (3D) micro-structures in poly(methylmethacrylate) by 2.0 MeV and 2.6 MeV protons micro-beam. Micro-channels (52 μm × 52 μm) have been realized. After chemical etching, the quality of the bottom and side walls of the produced structures in PMMA were analyzed using Scanning Transmission Ion Microscopy (STIM). © 2015 Elsevier B.V. All rights reserved.
Micro-patterns fabrication using focused proton beam lithography
CALCAGNO, Lucia
2016-01-01
Abstract
Proton beam writing technique was recently introduced at 3MV Tandetron accelerator at Nuclear Physics Institute in Rez (Czech Republic). It has been used, to produce three-dimensional (3D) micro-structures in poly(methylmethacrylate) by 2.0 MeV and 2.6 MeV protons micro-beam. Micro-channels (52 μm × 52 μm) have been realized. After chemical etching, the quality of the bottom and side walls of the produced structures in PMMA were analyzed using Scanning Transmission Ion Microscopy (STIM). © 2015 Elsevier B.V. All rights reserved.File in questo prodotto:
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