Time-of-flight secondary ion mass spectrometry (ToF-SIMS) has been employed to monitor the chemical changes occurring with continuous UV irradiation in the surface region of neat films of polystyrene and the copolymer of styrene and 2-(2-hydroxy-3-vinyl-5-methylphenyl)benzotriazole (HVB, 2% w/w). Previous conclusions concerning the relative rates of oxygen uptake of these systems have been confirmed. New data are presented that enable delineation of two different surface reactions and demonstrate activation of the polymer surface by HVB with respect to polymer degradation as well as oxygen uptake. Some conclusions are drawn concerning the mechanism by which this activation is achieved.
The Surface Photooxidation of Polystyrene, Part II: The Application of ToF-SIMS to Monitor Changes in the Surface Chemistry of Neat Polystyrene Films
BOTTINO, Francesco;DI PASQUALE, Giovanna;POLLICINO, Antonino
1992-01-01
Abstract
Time-of-flight secondary ion mass spectrometry (ToF-SIMS) has been employed to monitor the chemical changes occurring with continuous UV irradiation in the surface region of neat films of polystyrene and the copolymer of styrene and 2-(2-hydroxy-3-vinyl-5-methylphenyl)benzotriazole (HVB, 2% w/w). Previous conclusions concerning the relative rates of oxygen uptake of these systems have been confirmed. New data are presented that enable delineation of two different surface reactions and demonstrate activation of the polymer surface by HVB with respect to polymer degradation as well as oxygen uptake. Some conclusions are drawn concerning the mechanism by which this activation is achieved.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
