Conductive-atomic force microscopy is used to electrically characterize a nanometric metal-SiO2–Si n+ system with Au nanocluster inclusions in SiO2. The system shows a marked rectifyingbehavior at room temperature with a threshold voltage function of the cluster size. This behavior isinterpreted crossing physical considerations on metal-oxide-semiconductor structure and on doublebarrier tunnel junction device. The system fabricated and analyzed is proposed as a possible basiccomponent for nanoelectronic circuits working at room temperature.
Nanoscale voltage tunable rectifier by gold nanostructures embedded in SiO2
RUFFINO, FRANCESCO;GRIMALDI, Maria Grazia
2006-01-01
Abstract
Conductive-atomic force microscopy is used to electrically characterize a nanometric metal-SiO2–Si n+ system with Au nanocluster inclusions in SiO2. The system shows a marked rectifyingbehavior at room temperature with a threshold voltage function of the cluster size. This behavior isinterpreted crossing physical considerations on metal-oxide-semiconductor structure and on doublebarrier tunnel junction device. The system fabricated and analyzed is proposed as a possible basiccomponent for nanoelectronic circuits working at room temperature.File in questo prodotto:
File | Dimensione | Formato | |
---|---|---|---|
Nanoscale Voltage tunable tunnel rectifier by gold nanostructures embedded in SiO2.pdf
solo gestori archivio
Tipologia:
Versione Editoriale (PDF)
Licenza:
Non specificato
Dimensione
84.15 kB
Formato
Adobe PDF
|
84.15 kB | Adobe PDF | Visualizza/Apri |
I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.