Metal organic–chemical vapor deposition (MO-CVD) is widely used to grow multicomponent metal oxide films. The industrial equipment consists of complex CVD reactors fully dedicated to specific deposition processes. R&D activities require flexible and low-cost apparatus, which can easily be switched between various CVD processes. These systems must feature both good performance in tuning the operational parameters and flexible efficiency in management. In this work, a quite innovative solution for a conditioning system that is highly suitable for low-cost MO-CVD reactors (for R&D purposes) is discussed. A smart distributed network of sensors and actuators, based on a field point system controlled by a virtual instrument, is proposed. The system allows accurate control of operational parameters, suitable conditioning sections and a user-friendly interface.
|Titolo:||A Field Point Based Approach for Sensor Conditioning in MO-CVD Reactors|
|Autori interni:||ANDO', Bruno|
|Data di pubblicazione:||2003|
|Rivista:||IEEE TRANSACTIONS ON INSTRUMENTATION AND MEASUREMENT|
|Appare nelle tipologie:||1.1 Articolo in rivista|