Metal complexes bearing linked hexafluoroacetylacetonates and ancillary Lewis ligands, have found wide interest as precursors for metalorganic chemical vapor deposition (MOCVD) since their first description in 1991. The relationships involving their molecular architectures, mass transport properties, decomposition mechanisms of both alkaline- and rare-earth metal precursors are compared to fluorine-free beta-diketonates. The perspectives of applications to MOCVD processes of a large range of advanced materials in thin film forms are discussed in detail. The effects due to the nature of the beta-diketonate moiety as well as of the ancillary ligand on mentioned properties are discussed in detail. (C) 2007 Elsevier B.V. All rights reserved.
|Titolo:||Engineering of molecular architectures of beta-diketonate precursors toward new advanced materials|
|Data di pubblicazione:||2007|
|Appare nelle tipologie:||1.1 Articolo in rivista|