The roughness σ is a very important characteristic of a deposited film. Its control is a key issue for technological applications ranging from micro- and nano-electronics, to plasmonics, and biology. In the present work, we use oblique sputtering depositions to tune the roughness of Ag films on mica. In particular, σ was found to increase from 1.90.2 to 10.20.9 nm when the deposition angle α increases from 0 to 0.84 radians (48 degrees), a regime characterized by the absence of strong shadowing effects. In this regime, the kinetic roughening was justified only on the basis of geometric factors allowing to conclude that , being σ0=σ(0) (the film roughness at normal deposition), and ΔD the standard deviation on the Ag nanostructures (forming the film) mean size <D>. This simple law was found to be in good agreement with the experimental data.
|Titolo:||Control of the kinetic roughening in nanostructured Ag films by oblique sputter-depositions|
|Data di pubblicazione:||2012|
|Appare nelle tipologie:||1.1 Articolo in rivista|