MOCVD processes adopting two different precursors Sr(tmhd)(2)pmdeta and Sr(hfac)(2)tetraglyme have been compared. In situ FT-IR monitoring shows that Sr(hfac)(2)tetraglyme posses suitable thermal stability upon sublimation and good mass-transport properties. By contrast, Sr(tmhd)(2)pmdeta posses lower stability which precludes efficient sublimation/evaporation processes, thus requiring reactors equipped with liquid delivery systems for efficient MOCVD processes. Insights on the MOCVD process have been obtained combining in situ FT-IR and ex situ XRD, XPS, SEM and EDX techniques. Homogeneous films have been deposited on Pt/TiN/SiO2/Si substrates in the 300-500 degrees C temperature range. XRD and XPS analyses have shown that fluorine or carbonate containing films are obtained adopting Sr(hfac)(2)tetraglyme or Sr(dpM)(2)pmdeta, respectively. (c) 2004 Published by Elsevier B.V.

Fluorine-free and fluorine containing MOCVD precursors for electronic oxides: a comparison

CONDORELLI, Guglielmo Guido;
2005-01-01

Abstract

MOCVD processes adopting two different precursors Sr(tmhd)(2)pmdeta and Sr(hfac)(2)tetraglyme have been compared. In situ FT-IR monitoring shows that Sr(hfac)(2)tetraglyme posses suitable thermal stability upon sublimation and good mass-transport properties. By contrast, Sr(tmhd)(2)pmdeta posses lower stability which precludes efficient sublimation/evaporation processes, thus requiring reactors equipped with liquid delivery systems for efficient MOCVD processes. Insights on the MOCVD process have been obtained combining in situ FT-IR and ex situ XRD, XPS, SEM and EDX techniques. Homogeneous films have been deposited on Pt/TiN/SiO2/Si substrates in the 300-500 degrees C temperature range. XRD and XPS analyses have shown that fluorine or carbonate containing films are obtained adopting Sr(hfac)(2)tetraglyme or Sr(dpM)(2)pmdeta, respectively. (c) 2004 Published by Elsevier B.V.
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.11769/34957
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