MOCVD processes adopting two different precursors Sr(tmhd)(2)pmdeta and Sr(hfac)(2)tetraglyme have been compared. In situ FT-IR monitoring shows that Sr(hfac)(2)tetraglyme posses suitable thermal stability upon sublimation and good mass-transport properties. By contrast, Sr(tmhd)(2)pmdeta posses lower stability which precludes efficient sublimation/evaporation processes, thus requiring reactors equipped with liquid delivery systems for efficient MOCVD processes. Insights on the MOCVD process have been obtained combining in situ FT-IR and ex situ XRD, XPS, SEM and EDX techniques. Homogeneous films have been deposited on Pt/TiN/SiO2/Si substrates in the 300-500 degrees C temperature range. XRD and XPS analyses have shown that fluorine or carbonate containing films are obtained adopting Sr(hfac)(2)tetraglyme or Sr(dpM)(2)pmdeta, respectively. (c) 2004 Published by Elsevier B.V.
|Titolo:||Fluorine-free and fluorine containing MOCVD precursors for electronic oxides: a comparison|
|Data di pubblicazione:||2005|
|Appare nelle tipologie:||1.1 Articolo in rivista|