The ability to obtain highly oriented, transparent, and conducting thin films of CdO, onto silica substrates, is demonstrated by using a novel, low-melting, MOCVD precursor. The observed film properties are interpreted on the basis of nonstoichiometric composition of CdO.

A liquid MOCVD precursor for thin films of CdO

GULINO, Antonino;
2002-01-01

Abstract

The ability to obtain highly oriented, transparent, and conducting thin films of CdO, onto silica substrates, is demonstrated by using a novel, low-melting, MOCVD precursor. The observed film properties are interpreted on the basis of nonstoichiometric composition of CdO.
CdO; film; XPS
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.11769/35164
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