Ion implantation has been used to dope single-crystal TiO2(110) in the near-surface region, The Sb dopant quenches an electronic state at about 1 eV binding energy usually observed in photoemission from undoped TiO2 and produces a new electronic surface state toward the bottom of the bulk bandgap. This is attributed to a 5s-5p hybrid orbital localised on surface Sb ions.

A photoemission study of electron states in Sb-ion implanted TiO2(110)

GULINO, Antonino;
1995-01-01

Abstract

Ion implantation has been used to dope single-crystal TiO2(110) in the near-surface region, The Sb dopant quenches an electronic state at about 1 eV binding energy usually observed in photoemission from undoped TiO2 and produces a new electronic surface state toward the bottom of the bulk bandgap. This is attributed to a 5s-5p hybrid orbital localised on surface Sb ions.
1995
TiO2; doping; UPS
File in questo prodotto:
File Dimensione Formato  
ASS-Sb-Ion-Impl-TiO2_1995.pdf

solo gestori archivio

Tipologia: Versione Editoriale (PDF)
Licenza: NON PUBBLICO - Accesso privato/ristretto
Dimensione 437.29 kB
Formato Adobe PDF
437.29 kB Adobe PDF   Visualizza/Apri

I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.11769/35168
Citazioni
  • ???jsp.display-item.citation.pmc??? ND
  • Scopus 10
  • ???jsp.display-item.citation.isi??? 10
social impact