X-ray grating interferometry is an excellent technique for X-ray phase contrast imaging and X-ray wavefront sensing with applications in materials science, biology and medical diagnosis. Among other requirements, the method depends on the availability of highly X-ray absorbing metallic gratings. Here, we report on the fabrication and characterization of high aspect ratio iridium gratings with a period of 1 μm and a depth of 30 μm combining deep reactive ion etching of silicon and atomic layer deposition of iridium. The implementation of such structures can greatly enhance the sensitivity of grating-based X-ray phase contrast imaging and thus, expand further its broad range of applications.

Towards sub-micrometer high aspect ratio X-ray gratings by atomic layer deposition of iridium

Romano, Lucia;
2018-01-01

Abstract

X-ray grating interferometry is an excellent technique for X-ray phase contrast imaging and X-ray wavefront sensing with applications in materials science, biology and medical diagnosis. Among other requirements, the method depends on the availability of highly X-ray absorbing metallic gratings. Here, we report on the fabrication and characterization of high aspect ratio iridium gratings with a period of 1 μm and a depth of 30 μm combining deep reactive ion etching of silicon and atomic layer deposition of iridium. The implementation of such structures can greatly enhance the sensitivity of grating-based X-ray phase contrast imaging and thus, expand further its broad range of applications.
2018
Atomic layer deposition of iridium; Deep reactive ion etching of silicon; Grating-based X-ray interferometry; Electronic, Optical and Magnetic Materials; Atomic and Molecular Physics, and Optics; Condensed Matter Physics; Surfaces, Coatings and Films; Electrical and Electronic Engineering
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.11769/357915
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