The continuum equation is used for modeling erosion rate, ion beam induced mixing, and reactions during the sputtering process involved in secondary ion mass spectrometry experiments. We developed a new approach that is able to incorporate the beam induced reactivity, so leading to a reasonable simulation of depth profiles of polymers and organic solids. The model allows one to include the effects of the reactive gas dosing on sputtering yield and damage accumulation during profiling. Comparison with experimental data confirms the quality of the model and strengthens the proposed approach.
|Titolo:||A Transport and Reaction Model for Simulating Cluster Secondary Ion Mass Spectrometry Depth Profiles of Organic Solids|
TUCCITTO, NUNZIO (Corresponding)
|Data di pubblicazione:||2016|
|Appare nelle tipologie:||1.1 Articolo in rivista|