Silica substrates were functionalized with a covalent 4-ClCH2C6H4SiCl3 monolayer. Additional covalent bonding of appropriate functional molecules to the silylated substrates was further achieved. The surface chemical characterization was carried out by angle resolved x-ray photoelectron measurements. Moreover, surface morphological characterizations were performed by atomic force microscopy measurements. Present results provide step by step information on the covalently linked monolayer during the synthetic procedure.

An x-ray photoelectron spectra and atomic force microscopy characterization of silica substrates engineered with a covalently assembled siloxane monolayer

GULINO, Antonino;CONDORELLI, Guglielmo Guido;MINEO, PLACIDO;
2005-01-01

Abstract

Silica substrates were functionalized with a covalent 4-ClCH2C6H4SiCl3 monolayer. Additional covalent bonding of appropriate functional molecules to the silylated substrates was further achieved. The surface chemical characterization was carried out by angle resolved x-ray photoelectron measurements. Moreover, surface morphological characterizations were performed by atomic force microscopy measurements. Present results provide step by step information on the covalently linked monolayer during the synthetic procedure.
siloxane; monolayer; XPS
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.11769/39428
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