A finite-difference approach for plasma microwave imaging profilometry

Plasma diagnostics is a topic of great interest in the physics and engineering community because the monitoring of plasma parameters plays a fundamental role in the development and optimization of plasma reactors. Towards this aim, microwave diagnostics, such as reflectometric, interferometric, and polarimetric techniques, can represent effective means. Besides the above, microwave imaging profilometry (MIP) may allow the obtaining of tomographic, i.e., volumetric, information of plasma that could overcome some intrinsic limitations of the standard non-invasive diagnostic approaches. However, pursuing MIP is not an easy task due to plasma’s electromagnetic features, which strongly depend on the working frequency, angle of incidence, polarization, etc., as well as on the need for making diagnostics in both large (meter-sized) and small (centimeter-sized) reactors. Furthermore, these latter represent extremely harsh environments, wherein different systems and equipment need to coexist to guarantee their functionality. Specifically, MIP entails solution of an inverse scattering problem, which is non-linear and ill-posed, and, in addition, in the one-dimensional case, is also severely limited in terms of achievable reconstruction accuracy and resolution. In this contribution, we address microwave inverse profiling of plasma assuming a high-frequency probing regime when magnetically confined plasma can be approximated as both an isotropic and weak penetrable medium. To this aim, we adopt a finite-difference frequency-domain (FDFD) formulation which allows dealing with non-homogeneous backgrounds introduced by unavoidable presence of plasma reactors.