Magnesium fluoride (MgF(2)) films are fabricated via low pressure metal-organic (MO)CVD on glass or quartz substrates from the novel single-source precursor Mg(hfa)(2)center dot 2H(2)O center dot 2diglyme. The nature and quality of films are scrutinized depending on relevant operational parameters, namely the deposition temperature, the precursor vaporization rate, and finally the flow of the oxygen reacting gas. Grazing incidence X-ray diffraction (GIXRD) data point to the formation of crystalline MgF(2) films. Scanning electron microscope (SEM) images indicate very homogeneous surfaces with grain dimensions dependent upon operational conditions, while energy dispersive X-ray (EDX) analyses point to the absence of any C or O contaminants. Smooth and homogeneous surfaces can be obtained upon deposition under high oxygen flow. The MgF(2) film deposited on glass at 400 degrees C under optimized conditions shows a similar to 80% transmittance in the range 300-800 nm. The high crystalline and optical quality of the MgF(2) films, deposited using mild deposition temperatures (< 450 degrees C) still confirms MOCVD as a versatile and competitive deposition technique.

MOCVD Fabrication of Magnesium Fluoride Films: Effects of Deposition Parameters on Structure and Morphology RID F-4514-2011

FRAGALA', Maria Elena;Malandrino G.
2011-01-01

Abstract

Magnesium fluoride (MgF(2)) films are fabricated via low pressure metal-organic (MO)CVD on glass or quartz substrates from the novel single-source precursor Mg(hfa)(2)center dot 2H(2)O center dot 2diglyme. The nature and quality of films are scrutinized depending on relevant operational parameters, namely the deposition temperature, the precursor vaporization rate, and finally the flow of the oxygen reacting gas. Grazing incidence X-ray diffraction (GIXRD) data point to the formation of crystalline MgF(2) films. Scanning electron microscope (SEM) images indicate very homogeneous surfaces with grain dimensions dependent upon operational conditions, while energy dispersive X-ray (EDX) analyses point to the absence of any C or O contaminants. Smooth and homogeneous surfaces can be obtained upon deposition under high oxygen flow. The MgF(2) film deposited on glass at 400 degrees C under optimized conditions shows a similar to 80% transmittance in the range 300-800 nm. The high crystalline and optical quality of the MgF(2) films, deposited using mild deposition temperatures (< 450 degrees C) still confirms MOCVD as a versatile and competitive deposition technique.
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.11769/41261
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