Pr1-xCaxMnO3 thin films have been deposited through an in situ metal organic chemical vapor deposition (MOCVD) process using a molten multi-metal source, consisting of the Pr(hfa)(3).diglyme, Ca(hfa)(2).tetraglyme, and Mn(tmhd)(3) precursor mixture on single crystal substrates such asLaAlO(3) (001) and MgO (001). Optimization of processing parameters has allowed the deposition of homogeneous thin films in morphology, composition, and thickness. The effect of substrate has been assessed in relation to structure and morphology. Field emission scanning electron microscope of a Pr0.7Ca0.3MnO3 film deposited at 1000 degrees C on MgO (001). (C) 2015 WILEY - VCH Verlag GmbH & Co. KGaA, Weinheim
A practical MOCVD approach to the growth of Pr1-xCaxMnO3 films on single crystal substrates
CONDORELLI, Guglielmo Guido;MALANDRINO, Graziella
2015-01-01
Abstract
Pr1-xCaxMnO3 thin films have been deposited through an in situ metal organic chemical vapor deposition (MOCVD) process using a molten multi-metal source, consisting of the Pr(hfa)(3).diglyme, Ca(hfa)(2).tetraglyme, and Mn(tmhd)(3) precursor mixture on single crystal substrates such asLaAlO(3) (001) and MgO (001). Optimization of processing parameters has allowed the deposition of homogeneous thin films in morphology, composition, and thickness. The effect of substrate has been assessed in relation to structure and morphology. Field emission scanning electron microscope of a Pr0.7Ca0.3MnO3 film deposited at 1000 degrees C on MgO (001). (C) 2015 WILEY - VCH Verlag GmbH & Co. KGaA, WeinheimI documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
