Metal Organic Chemical Vapor Deposition (MOCVD) and Pulsed Laser Deposition (PLD) techniques have been used for the growth of CaCu3Ti4O12 (CCTO) thin films on La0.9Sr1.1NiO4/LaAlO3 (LSNO/LAO) stack. (1 0 0) oriented CCTO films have been formed through both deposition routes and film complete structural and morphological characterizations have been carried out using several techniques (X-ray diffraction, scanning electron microscopy, energy-filtered transmission electron microscopy). The comparative study demonstrated some differences at the CCTO/LSNO interfaces depending on the adopted deposition technique. Chemical/structural modification of the LSNO electrode probably occurred as a function of the different oxygen partial pressure used in the PLD and MOCVD processes. (C) 2012 Elsevier B.V. All rights reserved.
|Titolo:||CaCu3Ti4O12 thin films on conductive oxide electrode: A comparative study between chemical and physical vapor deposition routes|
|Data di pubblicazione:||2012|
|Citazione:||CaCu3Ti4O12 thin films on conductive oxide electrode: A comparative study between chemical and physical vapor deposition routes / Catalano MR; Malandrino G; Bongiorno C; Toro RG; Fiorenza P; Bodeux R; Wolfman J; Gervais M; Lambert CA; Gervais F; Lo Nigro R. - In: MATERIALS CHEMISTRY AND PHYSICS. - ISSN 0254-0584. - 133:2-3(2012), pp. 1108-1115.|
|Appare nelle tipologie:||1.1 Articolo in rivista|