The novel [Co(C5F6HO2)2· 2H2O·CH3(OCH2CH2) 4-OCH3] low-melting adduct has been synthesized and characterized. Very mild heating results in the anhydrous Co(hfac) 2tetraglyme liquid and thermal stable complex that evaporates intact. This adduct has proven to be a well-suited precursor for MOCVD of cobalt oxide films.

A novel self-generating liquid MOCVD precursor for Co3O4 thin films

GULINO, Antonino;
2003-01-01

Abstract

The novel [Co(C5F6HO2)2· 2H2O·CH3(OCH2CH2) 4-OCH3] low-melting adduct has been synthesized and characterized. Very mild heating results in the anhydrous Co(hfac) 2tetraglyme liquid and thermal stable complex that evaporates intact. This adduct has proven to be a well-suited precursor for MOCVD of cobalt oxide films.
cobalt oxide; film; XPS
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.11769/58326
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