Different praseodymium oxide phases have been obtained by varying oxygen partial pressure during the MOCVD process at 750 ° on Si(100). Hexagonal Pr2O3 has been obtained under oxygen deficient conditions, while at oxygen partial pressure higher than 0.7 torr oxidized phases, such as Pr6O11and/or PrO2, are dominant. Transmission electron microscopy (TEM) and energy filtered transmission electron microscopy (EFTEM) analyses have been used to characterize structural, compositional and morphological features of praseodymium oxide films.

Structural and compositional investigation of high k praseodymium oxide films deposited by MOCVD

Lo Nigro R.;Toro R.;Malandrino G.;Raineri V.;
2018-01-01

Abstract

Different praseodymium oxide phases have been obtained by varying oxygen partial pressure during the MOCVD process at 750 ° on Si(100). Hexagonal Pr2O3 has been obtained under oxygen deficient conditions, while at oxygen partial pressure higher than 0.7 torr oxidized phases, such as Pr6O11and/or PrO2, are dominant. Transmission electron microscopy (TEM) and energy filtered transmission electron microscopy (EFTEM) analyses have been used to characterize structural, compositional and morphological features of praseodymium oxide films.
2018
9781351074636
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.11769/585518
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