LO NIGRO, Raffaella
LO NIGRO, Raffaella
Università degli Studi di CATANIA
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CaCu3Ti4O12, a novel material for capacitive applications: Thin film growth and characterization
file da validare2007-01-01 Lo Nigro, R.; Toro, R. G.; Malandrino, G.; Fragala, I. L.; Fiorenza, P.; Raineri, V.
Electrical properties of MOCVD praseodymium oxide based MOS structures
file da validare2003-01-01 Lo Nigro, R.; Toro, R.; Malandrino, G.; Raineri, V.; Fragala, I. L.
Properties of Pr-based high k dielectric films obtained by Metal-Organic Chemical Vapor Deposition
file da validare2004-01-01 Lo Nigro, R.; Toro, R. G.; Malandrino, G.; Rainen, V.; Fragala, I. L.
Structural and compositional investigation of high k praseodymium oxide films deposited by MOCVD
file da validare2018-01-01 Lo Nigro, R.; Toro, R.; Malandrino, G.; Bongiorno, C.; Raineri, V.; Fragala, I. L.
| Titolo | Data di pubblicazione | Autore(i) | File |
|---|---|---|---|
| CaCu3Ti4O12, a novel material for capacitive applications: Thin film growth and characterization | 1-gen-2007 | Lo Nigro, R.; Toro, R. G.; Malandrino, G.; Fragala, I. L.; Fiorenza, P.; Raineri, V. | file da validare |
| Electrical properties of MOCVD praseodymium oxide based MOS structures | 1-gen-2003 | Lo Nigro, R.; Toro, R.; Malandrino, G.; Raineri, V.; Fragala, I. L. | file da validare |
| Properties of Pr-based high k dielectric films obtained by Metal-Organic Chemical Vapor Deposition | 1-gen-2004 | Lo Nigro, R.; Toro, R. G.; Malandrino, G.; Rainen, V.; Fragala, I. L. | file da validare |
| Structural and compositional investigation of high k praseodymium oxide films deposited by MOCVD | 1-gen-2018 | Lo Nigro, R.; Toro, R.; Malandrino, G.; Bongiorno, C.; Raineri, V.; Fragala, I. L. | file da validare |