Metal-organic (MO)CVD processes adopting the Sr(tmhd)(2)(.)pmdeta precursor have been investigated. In-situ Fourier-transform infrared spectroscopy (FTIR) monitoring has shown that Sr(tmhd)2.pmdeta possesses a low stability which precludes efficient sublimation/evaporation processes, and requires reactors equipped with a direct liquid injector (DLI) for suitable MOCVD processes. The deposition process results in the formation of polycrystalline SrO and/or SrCO3 films. The kinetics and the mechanism of film growth have been investigated combining in-situ FTIR techniques and ex-situ techniques for chemical and structural analyses - energy dispersive X-ray (EDX) microanalysis, X-ray photoelectron spectroscopy (XPS), and X-ray diffraction (XRD). Precursor decomposition occurs above 300 degrees C, leading to the formation of ketones and SrO films. Temperatures above 400 degrees C and partial pressures above 9 mtorr favor a further oxidation/combustion of the ligand and its by-products, thus producing greater amounts of CO2, and hence of SrCO3.
|Titolo:||MOCVD of Sr-containing oxides: Transport properties and deposition mechanisms of the Sr(tmhd)(2)center dot pmdeta precursor|
|Data di pubblicazione:||2005|
|Citazione:||MOCVD of Sr-containing oxides: Transport properties and deposition mechanisms of the Sr(tmhd)(2)center dot pmdeta precursor / Bedoya C; Condorelli G; Motta A; Di Mauro A; Anastasi G; Fragala IL; Lisoni JG; Wouters D. - In: CHEMICAL VAPOR DEPOSITION. - ISSN 0948-1907. - 11:5(2005), pp. 269-275.|
|Appare nelle tipologie:||1.1 Articolo in rivista|