MOCVD has been applied to the first successful deposition of CeO2 (100) oriented films on no-rolled Hastelloy C276. The presently found columnar grain morphologies have been related to the zone model proposed by Mochvan and Demchishin for physical vapor deposition processes. The fiber texture strongly depends on the deposition temperature.
Metal-organic chemical vapor deposition of CeO2 < 100 > oriented films on no-rolled Hastelloy C276
MALANDRINO, Graziella;
2001-01-01
Abstract
MOCVD has been applied to the first successful deposition of CeO2 (100) oriented films on no-rolled Hastelloy C276. The presently found columnar grain morphologies have been related to the zone model proposed by Mochvan and Demchishin for physical vapor deposition processes. The fiber texture strongly depends on the deposition temperature.File in questo prodotto:
Non ci sono file associati a questo prodotto.
I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
