MOCVD has been applied to the first successful deposition of CeO2 (100) oriented films on no-rolled Hastelloy C276. The presently found columnar grain morphologies have been related to the zone model proposed by Mochvan and Demchishin for physical vapor deposition processes. The fiber texture strongly depends on the deposition temperature.

Metal-organic chemical vapor deposition of CeO2 < 100 > oriented films on no-rolled Hastelloy C276

MALANDRINO, Graziella;
2001

Abstract

MOCVD has been applied to the first successful deposition of CeO2 (100) oriented films on no-rolled Hastelloy C276. The presently found columnar grain morphologies have been related to the zone model proposed by Mochvan and Demchishin for physical vapor deposition processes. The fiber texture strongly depends on the deposition temperature.
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Utilizza questo identificativo per citare o creare un link a questo documento: http://hdl.handle.net/20.500.11769/60053
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