The surface photochemistry of polystyrene is shown to exhibit features that distinguish it from the bulk and from the polymer in solution. We report on the use of medium‐ and high‐resolution time‐of‐flight secondary ion mass spectrometry and X‐ray photoelectron spectroscopy in an investigation of the changes that occur as a result of exposure to UV light from a ‘black lamp’ source. The experiment mimics closely the effects of natural sunlight. It is shown that there are substantial changes occurring in the surface molecular structure of polystyrene on irradiation, which correspond to loss of aromaticity, and that these changes precede any uptake of oxygen. © 1995 Hüthig & Wepf Verlag, Zug
X‐ray photoelectron spectroscopy (XPS) and time‐of‐flight secondary ion mass spectrometry (ToF‐SIMS) analysis of UV‐exposed polystyrene
Pollicino A.
1995-01-01
Abstract
The surface photochemistry of polystyrene is shown to exhibit features that distinguish it from the bulk and from the polymer in solution. We report on the use of medium‐ and high‐resolution time‐of‐flight secondary ion mass spectrometry and X‐ray photoelectron spectroscopy in an investigation of the changes that occur as a result of exposure to UV light from a ‘black lamp’ source. The experiment mimics closely the effects of natural sunlight. It is shown that there are substantial changes occurring in the surface molecular structure of polystyrene on irradiation, which correspond to loss of aromaticity, and that these changes precede any uptake of oxygen. © 1995 Hüthig & Wepf Verlag, ZugI documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
