Direct surface and depth profiling chemical analysis of advanced multilayer materials demands "multi-dimensional" knowledge, including simultaneous elemental and molecular information. Pulsed radiofrequency glow discharges (pulsed rf-GDs) with detection by time of flight mass spectrometry (TOFMS) provide direct chemical information from a great variety of materials in a fast and easy way. On the other hand, the temporal distribution of the applied power in pulsed rf-GDs produces three main regimes in the discharge (prepeak, plateau and afterpeak) with different mechanisms of ionization. As a result, the quasi-simultaneous acquisition of elemental and molecular ions (at the different pulse regimes) becomes a real possibility when coupling the GD ion source to a fast TOF mass spectrometer.
|Titolo:||Radiofrequency glow discharge time of flight mass spectrometry for thin films analysis: Pulsed mode versus continuous mode|
|Data di pubblicazione:||2009|
|Citazione:||Radiofrequency glow discharge time of flight mass spectrometry for thin films analysis: Pulsed mode versus continuous mode / Bordel, N.; Lobo, L.; Pisonero, J; Pereiro, R; Tuccitto, Nunzio; Licciardello, Antonino; Tempez, A; Chapon, P; Hohl, M; Michler, J; Sanz Medel, A.. - In: YEJIN FENXI. - ISSN 1000-7571. - 29:11(2009), pp. 1-7.|
|Appare nelle tipologie:||1.1 Articolo in rivista|