Metal-organic chemical vapor deposition of Bi2Mn4O10 films on SrTiO3 (100)

Bi(2)Mn(4)O(10) films were deposited on SrTiO(3) (100) substrates via metal-organic chemical vapor deposition (MOCVD) from the Bi(phenyl)(3) and Mn(tmhd)(3) (Htmhd = 2,2,6,6-tetramethyl-3,5-heptanedione) precursors. The films were deposited in the temperature range of 600-800 degrees C. The X-ray diffraction (XRD) characterization indicates that the Bi(2)Mn(4)O(10) phase is stable within the investigated range, but the temperature plays a crucial role in determining the out-of-plane orientation of the films. The SEM shows very homogeneous surfaces with a fiber texture morphology at the highest deposition temperature. The AFM data indicate a textured surface with a root mean square roughness of 77.67 nm for films deposited at 800 degrees C. (C) 2008 Elsevier B.V. All rights reserved.