Silicon oxide and silicon nitride surfaces have been treated with 1-octadecene at similar to200degreesC. The resulting film topography has been inspected by atomic force microscopy (AFM), showing a densely packed organic coating with a corrugation of some tenths of a nanometre. High-mass-resolution time-of-flight secondary ion mass spectrometry (ToF-SIMS) spectra from such surfaces display octadecene- as well as substrate-related peaks. Furthermore, peaks diagnostic of the formation of SiOC or SiC linkages are observed in the case of silicon oxide, whereas the same peaks and those due to SiNC species have been observed in the case of silicon nitride. These results suggest that 1-octadecene molecules are chemisorbed on the substrate. Contact angle measurements and AFMforce spectroscopy measurements allow comparison upon the macroscopic and nanoscopic scale, respectively, of the surface free energy modification due to the formation of the organic coating. Copyright (C) 2002 John Wiley Sons, Ltd.
|Titolo:||Adhesion properties on nanometric scale of silicon oxide and silicon nitride surfaces modified by 1-octadecene RID E-3893-2010|
|Data di pubblicazione:||2002|
|Citazione:||Adhesion properties on nanometric scale of silicon oxide and silicon nitride surfaces modified by 1-octadecene RID E-3893-2010 / Pignataro B; Grasso G; Renna L; Marletta G. - 33:2(2002), pp. 54-58.|
|Appare nelle tipologie:||1.1 Articolo in rivista|