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EnglishTi, Fe, and Co silicide layers, 80-200 nm thick, on top of single crystal silicon substrate have been melted by 25-ns ruby laser pulses and the resolidified structures have been analyzed by transmission electron microscopy, X-ray diffraction, and Rurtherford backscattering spectrometry. Metastable phases and/or epitaxial layers are obtained upon solidifcation, The transient molten layer has been monitored by means of time-resolved optical measurements with nanosecond resolution; in all cases solidification velocity of the order of 1 m.s-1 was observed, and in one case liquid undercooling as much as 800 K was estimated.
| Titolo: | PULSED-LASER MELTING AND RESOLIDIFICATION OF METAL SILICIDE LAYERS | |
| Autori interni: | ||
| Data di pubblicazione: | 1993 | |
| Rivista: | ||
| Abstract: | Ti, Fe, and Co silicide layers, 80-200 nm thick, on top of single crystal silicon substrate have been melted by 25-ns ruby laser pulses and the resolidified structures have been analyzed by transmission electron microscopy, X-ray diffraction, and Rurtherford backscattering spectrometry. Metastable phases and/or epitaxial layers are obtained upon solidifcation, The transient molten layer has been monitored by means of time-resolved optical measurements with nanosecond resolution; in all cases solidification velocity of the order of 1 m.s-1 was observed, and in one case liquid undercooling as much as 800 K was estimated. | |
| Handle: | http://hdl.handle.net/20.500.11769/9728 | |
| Appare nelle tipologie: | 1.1 Articolo in rivista |
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