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EnglishWe report on high responsivity, broadband metal/insulator/semiconductor photodetectors with amorphous Ge quantum dots (a-Ge QDs) as the active absorbers embedded in a silicon dioxide matrix. Spectral responsivities between 1-4 A/W are achieved in the 500-900 nm wavelength range with internal quantum efficiencies (IQEs) as high as similar to 700%. We investigate the role of a-Ge QDs in the photocurrent generation and explain the high IQE as a result of transport mechanisms via photoexcited QDs. These results suggest that a-Ge QDs are promising for high-performance integrated optoelectronic devices that are fully compatible with silicon technology in terms of fabrication and thermal budget. (C) 2011 American Institute of Physics. [doi: 10.1063/1.3597360]
| Titolo: | High-efficiency silicon-compatible photodetectors based on Ge quantum dots |
| Autori interni: | |
| Data di pubblicazione: | 2011 |
| Rivista: | |
| Handle: | http://hdl.handle.net/20.500.11769/12023 |
| Appare nelle tipologie: | 1.1 Articolo in rivista |
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