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EnglishIn this work the interface between transition metals (Fe, Co) and Si has been investigated by soft X-ray photoemission spectroscopy. Synchrotron radiation has been used as photon source, measuring valence bands, Si2p and metal 3p core levels with high surface sensitivity. CoSi2 and beta-FeSi2 chemical phases have been obtained by thermal annealing (500-800-degrees-C) of thin films deposited onto room temperature Si<111> and <100> oriented wafers. Moreover, for the first time to our knowledge, a mixed (Fe0.785-Co0.25)/Si multilayered interface has been studied, showing remarkable differences with respect to single-metal deposition. RI Margaritondo, Giorgio/B-1367-2008
| Titolo: | PHOTOEMISSION BY SYNCHROTRON RADIATION FROM FE/SI, CO/SI AND (FE-CO)/SI INTERFACES | |
| Autori interni: | ||
| Data di pubblicazione: | 1992 | |
| Rivista: | ||
| Abstract: | In this work the interface between transition metals (Fe, Co) and Si has been investigated by soft X-ray photoemission spectroscopy. Synchrotron radiation has been used as photon source, measuring valence bands, Si2p and metal 3p core levels with high surface sensitivity. CoSi2 and beta-FeSi2 chemical phases have been obtained by thermal annealing (500-800-degrees-C) of thin films deposited onto room temperature Si<111> and <100> oriented wafers. Moreover, for the first time to our knowledge, a mixed (Fe0.785-Co0.25)/Si multilayered interface has been studied, showing remarkable differences with respect to single-metal deposition. RI Margaritondo, Giorgio/B-1367-2008 | |
| Handle: | http://hdl.handle.net/20.500.11769/42222 | |
| Appare nelle tipologie: | 1.1 Articolo in rivista |
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