Sfoglia per Autore
ION-INDUCED ANNEALING AND AMORPHIZATION OF ISOLATED DAMAGE CLUSTERS IN SI
file da validare1990-01-01 Battaglia, A; Priolo, Francesco; Rimini, E; Ferla, G.
CONCENTRATION-DEPENDENCE AND INTERFACIAL INSTABILITIES DURING ION-BEAM ANNEALING OF ARSENIC-DOPED SILICON
file da validare1990-01-01 Priolo, Francesco; Rimini, E; Spinella, C; Ferla, G.
PHENOMENOLOGICAL DESCRIPTION OF ION-BEAM-INDUCED EPITAXIAL CRYSTALLIZATION OF AMORPHOUS-SILICON
file da validare1990-01-01 Priolo, Francesco; Spinella, C; Rimini, E.
HIGH-ENERGY CHANNELING IMPLANTS OF PHOSPHORUS ALONG THE SILICON[100] AND SILICON[110] AXES
file da validare1991-01-01 Raineri, V; Setola, R; Priolo, Francesco; Rimini, E; Galvagno, G.
INFLUENCE OF DOPING ON ION-INDUCED GROWTH AND SHRINKAGE OF PARTIAL DAMAGE IN SILICON
file da validare1991-01-01 Battaglia, A; Priolo, Francesco; Rimini, E.
EPITAXIAL REALIGNMENT OF POLYCRYSTALLINE SI LAYERS BY RAPID THERMAL ANNEALING
file da validare1991-01-01 Benyaich, F; Priolo, Francesco; Rimini, E; Spinella, C; Ward, P; Baroetto, F.
REALIGNMENT OF ARSENIC DOPED POLYCRYSTALLINE SI FILMS BY DOUBLE STEP ANNEALING
file da validare1991-01-01 Benyaich, F; Priolo, Francesco; Rimini, E; Spinella, C; Ward, P.
CONCENTRATION PROFILES AND ELECTRICAL CHARACTERIZATION OF HIGH-ENERGY PHOSPHORUS IMPLANTS IN (100) SILICON
file da validare1991-01-01 Galvagno, G; Cacciato, A; Benyaich, F; Raineri, V; Priolo, Francesco; Rimini, E; Capizzi, S; Romano, P.
REALIGNMENT OF AS DOPED SILICON FILMS DEPOSITED ON (100) SILICON SUBSTRATES
file da validare1991-01-01 Benyaich, F; Priolo, Francesco; Rimini, E; Spinella, C; Baroetto, F; Cannavo, S; Ward, P.
EVOLUTION OF LOW-FLUENCE HEAVY-ION DAMAGE IN SI UNDER HIGH-ENERGY ION IRRADIATION
file da validare1991-01-01 Battaglia, A; Priolo, Francesco; Spinella, C; Rimini, E.
ION-ASSISTED NUCLEATION IN AMORPHOUS-SILICON - ION MASS AND DOSE-RATE EFFECTS
file da validare1991-01-01 Spinella, C; Battaglia, A; Priolo, Francesco; Campisano, Su
ION-ASSISTED CRYSTALLIZATION IN SILICON - EPITAXY AND GRAIN-GROWTH
file da validare1991-01-01 Spinella, C; Priolo, Francesco; Lombardo, S; Campisano, Su; Rimini, E.
AMORPHOUS CRYSTAL SILICON INTERFACES - STRUCTURE AND MOVEMENT UNDER ION-BEAM IRRADIATION
file da validare1992-01-01 Battaglia, A; Priolo, Francesco; Rimini, E.
GROWTH-SITE-LIMITED CRYSTALLIZATION OF AMORPHOUS-SILICON
file da validare1992-01-01 Custer, Js; Battaglia, A; Saggio, M; Priolo, Francesco
KINETIC AND STRUCTURAL STUDY OF THE EPITAXIAL REALIGNMENT OF POLYCRYSTALLINE SI FILMS
file da validare1992-01-01 Benyaich, F; Priolo, Francesco; Rimini, E; Spinella, C.
MEV P IMPLANTS IN SILICON - EXPERIMENTS AND SIMULATION
file da validare1992-01-01 Galvagno, G; Raineri, V; Setola, R; Priolo, Francesco; Rimini, E.
CRYSTALLIZATION KINETICS OF BORON-IMPLANTED AND GERMANIUM-IMPLANTED (100) SI - A BALANCE BETWEEN DOPING AND STRAIN EFFECTS
file da validare1992-01-01 Corni, F; Tonini, R; Ottaviani, G; Servidori, M; Priolo, Francesco
MECHANISMS OF ION-BEAM-ENHANCED DIFFUSION IN AMORPHOUS-SILICON
file da validare1992-01-01 Coffa, S; Jacobson, Dc; Poate, Jm; Priolo, Francesco
HIGH-ENERGY P-IMPLANTS IN SILICON
file da validare1992-01-01 Raineri, V; Cacciato, A; Benyaich, F; Priolo, Francesco; Rimini, E; Galvagno, G; Capizzi, S.
STRUCTURAL CHARACTERIZATION OF THE EPITAXIAL REALIGNMENT OF POLYCRYSTALLINE SILICON FILMS
file da validare1992-01-01 Benyaich, F; Priolo, Francesco; Rimini, E; Spinella, C; Ward, P.
Titolo | Data di pubblicazione | Autore(i) | File |
---|---|---|---|
ION-INDUCED ANNEALING AND AMORPHIZATION OF ISOLATED DAMAGE CLUSTERS IN SI | 1-gen-1990 | Battaglia, A; Priolo, Francesco; Rimini, E; Ferla, G. | file da validare |
CONCENTRATION-DEPENDENCE AND INTERFACIAL INSTABILITIES DURING ION-BEAM ANNEALING OF ARSENIC-DOPED SILICON | 1-gen-1990 | Priolo, Francesco; Rimini, E; Spinella, C; Ferla, G. | file da validare |
PHENOMENOLOGICAL DESCRIPTION OF ION-BEAM-INDUCED EPITAXIAL CRYSTALLIZATION OF AMORPHOUS-SILICON | 1-gen-1990 | Priolo, Francesco; Spinella, C; Rimini, E. | file da validare |
HIGH-ENERGY CHANNELING IMPLANTS OF PHOSPHORUS ALONG THE SILICON[100] AND SILICON[110] AXES | 1-gen-1991 | Raineri, V; Setola, R; Priolo, Francesco; Rimini, E; Galvagno, G. | file da validare |
INFLUENCE OF DOPING ON ION-INDUCED GROWTH AND SHRINKAGE OF PARTIAL DAMAGE IN SILICON | 1-gen-1991 | Battaglia, A; Priolo, Francesco; Rimini, E. | file da validare |
EPITAXIAL REALIGNMENT OF POLYCRYSTALLINE SI LAYERS BY RAPID THERMAL ANNEALING | 1-gen-1991 | Benyaich, F; Priolo, Francesco; Rimini, E; Spinella, C; Ward, P; Baroetto, F. | file da validare |
REALIGNMENT OF ARSENIC DOPED POLYCRYSTALLINE SI FILMS BY DOUBLE STEP ANNEALING | 1-gen-1991 | Benyaich, F; Priolo, Francesco; Rimini, E; Spinella, C; Ward, P. | file da validare |
CONCENTRATION PROFILES AND ELECTRICAL CHARACTERIZATION OF HIGH-ENERGY PHOSPHORUS IMPLANTS IN (100) SILICON | 1-gen-1991 | Galvagno, G; Cacciato, A; Benyaich, F; Raineri, V; Priolo, Francesco; Rimini, E; Capizzi, S; Romano, P. | file da validare |
REALIGNMENT OF AS DOPED SILICON FILMS DEPOSITED ON (100) SILICON SUBSTRATES | 1-gen-1991 | Benyaich, F; Priolo, Francesco; Rimini, E; Spinella, C; Baroetto, F; Cannavo, S; Ward, P. | file da validare |
EVOLUTION OF LOW-FLUENCE HEAVY-ION DAMAGE IN SI UNDER HIGH-ENERGY ION IRRADIATION | 1-gen-1991 | Battaglia, A; Priolo, Francesco; Spinella, C; Rimini, E. | file da validare |
ION-ASSISTED NUCLEATION IN AMORPHOUS-SILICON - ION MASS AND DOSE-RATE EFFECTS | 1-gen-1991 | Spinella, C; Battaglia, A; Priolo, Francesco; Campisano, Su | file da validare |
ION-ASSISTED CRYSTALLIZATION IN SILICON - EPITAXY AND GRAIN-GROWTH | 1-gen-1991 | Spinella, C; Priolo, Francesco; Lombardo, S; Campisano, Su; Rimini, E. | file da validare |
AMORPHOUS CRYSTAL SILICON INTERFACES - STRUCTURE AND MOVEMENT UNDER ION-BEAM IRRADIATION | 1-gen-1992 | Battaglia, A; Priolo, Francesco; Rimini, E. | file da validare |
GROWTH-SITE-LIMITED CRYSTALLIZATION OF AMORPHOUS-SILICON | 1-gen-1992 | Custer, Js; Battaglia, A; Saggio, M; Priolo, Francesco | file da validare |
KINETIC AND STRUCTURAL STUDY OF THE EPITAXIAL REALIGNMENT OF POLYCRYSTALLINE SI FILMS | 1-gen-1992 | Benyaich, F; Priolo, Francesco; Rimini, E; Spinella, C. | file da validare |
MEV P IMPLANTS IN SILICON - EXPERIMENTS AND SIMULATION | 1-gen-1992 | Galvagno, G; Raineri, V; Setola, R; Priolo, Francesco; Rimini, E. | file da validare |
CRYSTALLIZATION KINETICS OF BORON-IMPLANTED AND GERMANIUM-IMPLANTED (100) SI - A BALANCE BETWEEN DOPING AND STRAIN EFFECTS | 1-gen-1992 | Corni, F; Tonini, R; Ottaviani, G; Servidori, M; Priolo, Francesco | file da validare |
MECHANISMS OF ION-BEAM-ENHANCED DIFFUSION IN AMORPHOUS-SILICON | 1-gen-1992 | Coffa, S; Jacobson, Dc; Poate, Jm; Priolo, Francesco | file da validare |
HIGH-ENERGY P-IMPLANTS IN SILICON | 1-gen-1992 | Raineri, V; Cacciato, A; Benyaich, F; Priolo, Francesco; Rimini, E; Galvagno, G; Capizzi, S. | file da validare |
STRUCTURAL CHARACTERIZATION OF THE EPITAXIAL REALIGNMENT OF POLYCRYSTALLINE SILICON FILMS | 1-gen-1992 | Benyaich, F; Priolo, Francesco; Rimini, E; Spinella, C; Ward, P. | file da validare |
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